Continuum model of shot noise and line edge roughness

被引:17
|
作者
Gallatin, GM [1 ]
机构
[1] IBM Corp, Thomas J Watson Res Ctr, Yorktown Hts, NY 10598 USA
关键词
D O I
10.1117/12.425198
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Decreasing feature size implies increased sensitivity to statistical fluctuations which impact critical dimension (CD) uniformity and control. In a recent work Gallatin and Liddle presented equations which describe the basic processes leading to surface and line edge roughness (LER) in a chemically amplified resist. Retaining only the lowest order terms in what is inherently, a very nonlinear problem they were able to derive a scaling law and other dependencies which show reasonable agreement with experimental data. Here the analysis of the same equations is extended and expanded to include the dominant nonlinear effects.
引用
收藏
页码:123 / 132
页数:10
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