Free-space-wiring fabrication in nano-space by focused-ion-beam chemical vapor deposition

被引:104
|
作者
Morita, T
Kometani, R
Watanabe, K
Kanda, K
Haruyama, Y
Hoshino, T
Kondo, K
Kaito, T
Ichihashi, T
Fujita, J
Ishida, M
Ochiai, Y
Tajima, T
Matsui, S
机构
[1] LASTI, Grad Sch Sci, Himeji Inst Technol, Ako, Hyogo 6781205, Japan
[2] Japan Sci & Technol Coi, Kawaguchi Ctr, CREST JST, Kawaguchi, Saitama 3320012, Japan
[3] Seiko Instruments Inc, Oyama, Shizuoka 4101393, Japan
[4] NEC Fundamental Res Labs, Tsukuba, Ibaraki 3058051, Japan
[5] Crestec Co, Hachioji, Tokyo 1920045, Japan
来源
关键词
D O I
10.1116/1.1630329
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Focused-ion-beam chemical vapor deposition (FIB-CVD) is an excellent technology for forming three-dimensional nanostructures. Various diamond-like-carbon (DLC) free-space-wirings have been demonstrated by FIB-CVD using a computer-controlled pattern generator, which is a commercially available pattern generator for electron-beam (EB) lithography. The material composition and crystal structure of DLC free-space-wiring were studied by transmission-electron microscopy and energy-dispersive x-ray spectroscopy. As a result, it became clear that DLC free-space-wining is amorphous carbon containing a Ga core in the wire. Furthermore, the electrical resistivity measurement of DLC free-space-wiring was carried out by two terminal electrodes. An electrodes were fabricated by EB lithography and a lift-off process. The electrical resistivity was about 100 Omega cm at room temperature. (C) 2003 American Vacuum Society.
引用
收藏
页码:2737 / 2741
页数:5
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