Detection of surface changes of materials caused by intense irradiation with laser-plasma EUV source utilizing scattered or luminescent radiation excited with the EUV pulses

Extreme ultraviolet (EUV) radiation is absorbed in a thin surface layer of any material. Irradiation of material samples with intense EUV pulses may cause different surface changes. Some of them, especially connected with material desorption, can be clearly visible using an optical or electron microscope. Other changes concerning crystal structure or chemical composition may not be visible under the microscope. They can however be detected using the EUV radiation itself. In this paper a new method of measurement of surface changes by irradiation with a laser-plasma EUV source is presented. The radiation was collected and focused on a material surface using a specially designed multifoil collector. Radiation scattered or excited in the material was detected with the use of a Wolter-type mirror coupled to a back-illuminated CCD camera. Depending on material samples, images with different intensity distributions were registered. For some samples, the intensity distributions of the images obtained before and after irradiation were slightly different. The intensity differences in such cases allowed us to obtain differential images. The appearance of such images was assumed to be evidence of surface changes.