Nox formation in dielectric barrier discharge over CuZSM-5 catalyst in N2/O2.

被引：0
|
作者：
Zhu, AM [1 ]
Song, Q [1 ]
Niu, JH [1 ]
Xu, Y [1 ]
Yang, XF [1 ]
机构：
[1] Dalian Univ Technol, Lab Plasma Phys Chem, Dalian 116024, Peoples R China
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2003年 / 225卷
关键词：
D O I：
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中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
0023-CATL
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页码：U53 / U53
页数：1
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