Characteristics of semi-insulating, Fe-doped GaN substrates

被引:104
|
作者
Vaudo, RP [1 ]
Xu, XP [1 ]
Salant, A [1 ]
Malcarne, J [1 ]
Brandes, GR [1 ]
机构
[1] ATMI Inc, Danbury, CT 06810 USA
来源
关键词
D O I
10.1002/pssa.200303273
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Semi-insulating freestanding GaN substrates were produced by hydride vapor phase epitaxy using intentionally introduced iron impurity atoms to compensate residual donors in GaN. Variable temperature resistivity measurements determined the resistivity of an iron-doped GaN sample to be -3 x 10(5) Omega cm at 250 degreesC. The activation energy of the carrier was 0.51 eV and room temperature resistivity was determined to be similar to2 x 10(9) Omega cm at room temperature by linear fitting and extrapolation to room temperature. Near-infrared photoluminescence at 1.6 K exhibited sharp emission at 1.3 eV, associated with the T-4(1) (G) --> (6)A(1)(S) internal transition of the Fe3+ charge state. (C) 2003 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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收藏
页码:18 / 21
页数:4
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