Formation of micro-patterning ferroelectric films

被引：1

作者：

Zhao, Gaoyang ^{[1
]}

Mang, Weihua ^{[1
]}

Deng, Xiaocui ^{[1
]}

Xu, Guomin ^{[1
]}

机构：

[1] Xian Univ Technol, Sch Mat Sci & Engn, Xian 710048, Peoples R China

来源：

FERROELECTRICS | 2007年 / 357卷

关键词：

dferroelectric film; photosensitive gel film; array; hysteresis loop;

D O I：

10.1080/00150190701527498

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The photosensitive PLZT gel films were prepared by chemical modified sol-gel process, and then were irradiated by double-beam of He-Cd UV laser in different direction and twice irradiation, subsequently, the array of PLZT gel film was obtained by leaching the irradiated gel film in ethanol. Finally, the array of ferroelectric films was obtained after heat treatment, the dot area and thickness of which are 500 nm x 500 nm and 50 nm with pitch of 1000 nm. The results of AFM and TF-Analyzer 2000 online-test indicate that the ferroelectric dots are of the polarization reversal, and exhibit the ferroelectric behaviors.

引用

页码：28 / 34

页数：7

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