Emission Characteristics of a High-energy Pulsed-ion-beam Produced in a Dense Plasma Focus Device

被引:5
|
作者
Ito, Hiroaki [1 ]
Nishino, Yuuki [1 ]
Masugata, Katsumi [1 ]
机构
[1] Toyama Univ, Dept Elect & Elect Engn, Toyama 9308555, Japan
关键词
Plasma focus device; High-energy ion beam; Pinch plasma; X-RAY-EMISSION; NEUTRON PRODUCTION; DISCHARGES; DEPOSITION; MECHANISM; FILM;
D O I
10.3938/jkps.59.3674
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The characteristics of ion beams produced in a Mather-type plasma focus device have been studied. When a capacitor bank of 41.6 mu F was charged to 30 kV, the discharge current reached a peak current of 450 kA, and after the current dip, an ion current density of 8 kA/cm(2) with a pulse width of 60 ns was obtained 110 mm downstream from the top of the anode on the axis. In order to evaluate the angular distribution of the ion current density and the ion energy spectrum, we arrayed the biased ion collectors and the incident angle resolved energy spectrometers simultaneously at nine different angular positions (-80 degrees, -60 degrees, -40 degrees, -20 degrees, 0 degrees, 30 degrees, 50 degrees, 70 degrees, and 90 degrees) on a circumference of 110 mm in radius, centered at the focus. From measurements with the BIC, we found that the angular distribution of the ion current density was axially symmetric and that the ion current density decreased with increasing emission angle. Experimental results for the energy spectrum showed that the proton beam energy was distributed from 0.1 MeV to 1.4 MeV and that ions with energies lower than 300 keV were distributed widely over emission angles ranging from -80 degrees to 90 degrees, with higher-energy ions (>1 MeV) being confined to emission angles of -20 degrees similar to 30 degrees. In addition, the ion energy and the track density were found to decrease rapidly with increasing emission angle.
引用
收藏
页码:3674 / 3678
页数:5
相关论文
共 50 条
  • [1] Characteristics of the nitrogen ion beam produced in a plasma focus device
    Takao, K
    Shiotani, M
    Honda, T
    Kitamura, I
    Takahashi, T
    Masugata, K
    PPPS-2001: PULSED POWER PLASMA SCIENCE 2001, VOLS I AND II, DIGEST OF TECHNICAL PAPERS, 2001, : 731 - 734
  • [2] Ion Beam Emission in a Low Energy Plasma Focus Device
    Namini, Sanaz E.
    Khatir, H. Zakeri
    Ghoranneviss, M.
    Aghamir, M. F.
    Behbahani, R. A.
    Kashani, M.
    JOURNAL OF FUSION ENERGY, 2010, 29 (05) : 471 - 475
  • [3] Ion Beam Emission in a Low Energy Plasma Focus Device
    Sanaz E. Namini
    H. Zakeri khatir
    M. Ghoranneviss
    M. F. Aghamir
    R. A. Behbahani
    M. Kashani
    Journal of Fusion Energy, 2010, 29 : 471 - 475
  • [4] Damage and modification of materials produced by pulsed ion and plasma streams in Dense Plasma Focus device
    Pimenov, Valeriy N.
    Demina, Elena V.
    Maslyaev, Sergey A.
    Ivanov, Lev I.
    Gribkov, Vladimir A.
    Dubrovsky, Alexander V.
    Ugaste, Uelo
    Laas, Tonu
    Scholz, Marek
    Miklaszewski, Ryszard
    Kolman, Blagoslav
    Tartari, Agostino
    NUKLEONIKA, 2008, 53 (03) : 111 - 121
  • [5] Fabrication of DLC films by pulsed ion beam ablation in a dense plasma focus device
    Wang, Z. R.
    Yousefi, H. R.
    Nishino, Y.
    Ito, H.
    Masugata, K.
    PHYSICS LETTERS A, 2009, 373 (45) : 4169 - 4173
  • [6] HIGH-ENERGY DEUTERON BEAM GENERATED BY A PLASMA-FOCUS DEVICE
    YAMADA, Y
    KITAGAWA, Y
    YOKOYAMA, M
    JOURNAL OF APPLIED PHYSICS, 1985, 58 (01) : 188 - 192
  • [7] Analysis of nitrogen ion beam produced in dense plasma focus device using Faraday Cup
    Bhuyan, H
    Mohanty, SR
    Borthakur, TK
    Rawat, RS
    INDIAN JOURNAL OF PURE & APPLIED PHYSICS, 2001, 39 (11) : 698 - 703
  • [8] Ion beam emission in a low energy plasma focus device operating with methane
    Bhuyan, H
    Chuaqui, H
    Favre, M
    Mitchell, I
    Wyndham, E
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2005, 38 (08) : 1164 - 1169
  • [9] HIGH DISLOCATION DENSITY STRUCTURES AND HARDENING PRODUCED BY HIGH FLUENCY PULSED-ION-BEAM IMPLANTATION
    SHARKEEV, YP
    DIDENKO, AN
    KOZLOV, EV
    SURFACE & COATINGS TECHNOLOGY, 1994, 65 (1-3): : 112 - 120
  • [10] Characteristics of ion beams produced in a plasma focus device
    Takao, K
    Doi, Y
    Hirata, S
    Shiotani, M
    Kitamura, I
    Takahashi, T
    Masugata, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2001, 40 (2B): : 1013 - 1015