Photorefractive multiple quantum wells at 1064 nm

被引：12
|
作者：
Iwamoto, S [1 ]
Taketomi, S [1 ]
Kageshima, H [1 ]
Nishioka, M [1 ]
Someya, T [1 ]
Arakawa, Y [1 ]
Fukutani, K [1 ]
Shimura, T [1 ]
Kuroda, K [1 ]
机构：
[1] Univ Tokyo, Inst Ind Sci, Meguro Ku, Tokyo 1538505, Japan
来源：
OPTICS LETTERS | 2001年 / 26卷 / 01期
关键词：
D O I：
10.1364/OL.26.000022
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
We have fabricated photorefractive InGaAs/GaAs multiple quantum wells that are sensitive at wavelengths near 1.06 mum for what is believed to be the first time. We have measured four-wave-mixing diffraction efficiency, using a Nd:YAG laser. A maximum diffraction efficiency of 7 x 10(-4) and a cutoff grating period of similar to2 mum are obtained. (C) 2001 Optical Society of America OCIS codes: 160.5320, 160.6000, 190.5530.
引用
收藏
页码：22 / 24
页数：3
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