Improved stability of a supported liquid membrane process via hydrophobic modification of PVDF support by plasma activation and chemical vapor deposition

被引:24
|
作者
Thi Tuong Van Tran [1 ]
Chi Hieu Nguyen [1 ]
Lin, Wei-Cheng [2 ]
Juang, Ruey-Shin [2 ,3 ,4 ]
机构
[1] Ind Univ Ho Chi Minh City, Inst Environm Sci Engn & Management, Ho Chi Minh City, Vietnam
[2] Chang Gung Univ, Dept Chem & Mat Engn, Taoyuan 33302, Taiwan
[3] Chang Gung Mem Hosp, Dept Internal Med, Div Nephrol, Linkou, Taiwan
[4] Ming Chi Univ Technol, Dept Safety Hlth & Environm Engn, New Taipei 24301, Taiwan
关键词
Stability improvement; Supported liquid membrane; Hydrophobic modification; Plasma activation; Chemical vapor deposition; Electrical impedance spectroscopy; IONIC LIQUIDS; MICROPOROUS MEMBRANE; SURFACE MODIFICATION; TRANSPORT; PHENOL; MECHANISMS; POLYMERIZATION; EXTRACTION; REMOVAL; ACID;
D O I
10.1016/j.seppur.2021.119615
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
In this research, hydrophobic modification of a poly(vinylidene fluoride) (PVDF) membrane through plasma activation and chemical vapor deposition with trichloro(1H,1H,2H,2H-perfluorooctyl)silane was investigated. The modified membrane was used as a support to improve the stability of a supported liquid membrane (SLM) process. Various plasma conditions such as power (6.8, 10.5, and 18 W) and treatment time (1, 2.5, 5, 7.5, and 10 min) were explored. Physicochemical properties of the pristine and modified membranes including the morphology, hydrophobicity, and chemical structure were first analyzed. The hydrophobicity of modified membranes increased, due to successful incorporation of a fluorine-containing silane (a reagent for reducing surface free energy) on the outer surface of the membrane and the inner surface of open pores nearby. The impact of hydrophobic modification on the stability of SLMs was real-time explored by a non-destructive technique, electrical impedance spectroscopy (EIS), where phenol and ionic liquid 1-butyl-3-methylimidazole hexafluorophosphate were selected as the model solute and membrane liquid (organic phase). The stability issues of SLMs deduced from EIS analysis were further verified by mass transfer analysis and feed pH monitoring. Results showed that the modified membranes provided more stable and prolonged SLM processes but relatively slower transport. The optimal plasma condition was found to be 18-W power and 5-min treatment time, at which the hydrophobicity of PVDF support was maximized (water contact angle 142.0 degrees) and the most stable SLM was obtained (impedance reduction at 0.5-h time by ca. 60%). The mechanism causing the instability of the present SLM was finally identified. Plasma treatment and chemical vapor deposition with fluorine-containing silanes was an effective approach for enhancing the stability of an SLM and EIS was a powerful technique for real-time monitoring the instability behavior.
引用
收藏
页数:13
相关论文
共 34 条
  • [1] Enhancing the stability of supported liquid membrane in phenols removal process by hydrophobic modification
    Sun, Hao
    Yao, Jie
    Cong, Hao
    Li, Qi
    Li, Dan
    Liu, Bing
    [J]. CHEMICAL ENGINEERING RESEARCH & DESIGN, 2017, 126 : 209 - 216
  • [2] Hydrophobic Modification of Pectin Aerogels via Chemical Vapor Deposition
    Effraimopoulou, Eleni
    Jaxel, Julien
    Budtova, Tatiana
    Rigacci, Arnaud
    [J]. POLYMERS, 2024, 16 (12)
  • [3] Hydrophobic modification of a PVDF hollow fiber membrane by plasma activation and silane grafting for membrane distillation
    Jin, Qiaoru
    Zhang, Xue
    Li, Fuzhi
    Zhao, Xuan
    [J]. WATER SCIENCE AND TECHNOLOGY, 2023, 87 (11) : 2806 - 2819
  • [4] Hydrophobic modification of bacterial cellulose using oxygen plasma treatment and chemical vapor deposition
    Leal, Salome
    Cristelo, Cecilia
    Silvestre, Sara
    Fortunato, Elvira
    Sousa, Aureliana
    Alves, Anabela
    Correia, D. M.
    Lanceros-Mendez, S.
    Gama, Miguel
    [J]. CELLULOSE, 2020, 27 (18) : 10733 - 10746
  • [5] Hydrophobic modification of bacterial cellulose using oxygen plasma treatment and chemical vapor deposition
    Salomé Leal
    Cecília Cristelo
    Sara Silvestre
    Elvira Fortunato
    Aureliana Sousa
    Anabela Alves
    D. M. Correia
    S. Lanceros-Mendez
    Miguel Gama
    [J]. Cellulose, 2020, 27 : 10733 - 10746
  • [6] A new liquid precursor with improved thermal stability for chemical vapor deposition of copper
    Senzaki, Y
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1998, 145 (01) : 362 - 365
  • [7] Enhanced stability of metal organic frameworks via perfluorohexane plasma chemical vapor deposition
    DeCoste, Jared B.
    Peterson, Gregory W.
    Smith, Martin W.
    Stone, Corinne A.
    Willis, Colin R.
    [J]. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2012, 243
  • [8] Improved fabrication process for Ru/BST/Ru capacitor by liquid source chemical vapor deposition
    Tarutani, M
    Yamamuka, M
    Takenaga, T
    Kuroiwa, T
    Horikawa, T
    [J]. THIN SOLID FILMS, 2002, 409 (01) : 8 - 14
  • [9] OPTIMIZATION OF FILM AND MEMBRANE PREPARATION ON DIAMOND VIA MICROWAVE PLASMA CHEMICAL-VAPOR-DEPOSITION
    ANGER, E
    GICQUEL, A
    RAVET, MF
    WANG, ZZ
    ROUSSEAUX, F
    PERRIERE, J
    ROSSI, F
    FOURNIER, D
    PLAMANN, K
    [J]. VIDE-SCIENCE TECHNIQUE ET APPLICATIONS, 1995, 51 (276): : 139 - &
  • [10] Atmospheric pressure plasma enhanced chemical vapor deposition of hydrophobic coatings using fluorine-based liquid precursors
    Yim, Jacqueline H.
    Rodriguez-Santiago, Victor
    Williams, Andre A.
    Gougousi, Theodosia
    Pappas, Daphne D.
    Hirvonen, James K.
    [J]. SURFACE & COATINGS TECHNOLOGY, 2013, 234 : 21 - 32