Laser Molecular Beam Epitaxy Growth of GaN layer on Sapphire (0001) under various process conditions

We have grown high quality epitaxial GaN films on sapphire (0001) substrates using a ultra-high vacuum laser molecular beam epitaxy (MBE) system at different growth temperatures, deposition rate and nitrogen species. The HYPE grown GaN solid target was ablated at laser energy density 5 J/cm2 with laser frequency 5 Hz (low flux) and 10 Hz (high flux) in presence of r.f. nitrogen plasma. Structural properties of the epitaxial GaN films were characterized using high resolution x-ray diffraction, atomic force microscopy (AFM), and photoluminescence spectroscopy (PL). At high flux, the full width at half maximum (FWHM) of x-ray diffraction rocking curve of GaN (0002) peak decreases with increasing growth temperature from 500 to 720 degrees C. The GaN film grown at 700 degrees C with low flux shows a large FWHM (368 arc sec) with small grain sizes in comparison to the GaN film grown with high flux (FWHM: 110 arc sec). We have also studied the effect of high pressure nitrogen ambient during ablation of GaN target for growth of GaN films on sapphire with and without prenitridation of sapphire at growth temperature 500 degrees C. The typical PL measurement on the GaN film grown on sapphire using laser MBE system shows the high quality of GaN film with minimum defects. The obtained results suggest that the present growth technique could be an alternative for fabrication of high quality GaN based devices.