Unusual scaling for pulsed laser deposition

被引：40
|
作者：
Hinnemann, B [1 ]
Hinrichsen, H
Wolf, DE
机构：
[1] Univ Duisburg Gesamthsch, Fachbereich 10, D-47048 Duisburg, Germany
[2] Berg Univ Gesamthsch Wuppertal, Fachbereich 8, D-42097 Wuppertal, Germany
来源：
PHYSICAL REVIEW LETTERS | 2001年 / 87卷 / 13期
关键词：
D O I：
10.1103/PhysRevLett.87.135701
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
We show that a simple model for pulsed laser deposition exhibits an unusual type of scaling behavior for the island density in the submonolayer regime. This quantity is studied as a function of pulse intensity and deposition time. We find a data collapse for the ratios of the logarithms of these quantities, whereas conventional scaling as observed in molecular beam epitaxy involves ratios of powers.
引用
收藏
页码：1 / 135701
页数：4
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