Capacitance-Voltage(C-V) Characteristics of InGaAs/InAs/InGaAs Quantum Well MOSFET

被引:0
|
作者
Datta, Kanak [1 ]
Biswas, Sudipta Romen [1 ]
Rahman, Ehsanur [1 ]
Shadman, Abir [1 ]
Khosru, Quazi D. M. [1 ]
机构
[1] Bangladesh Univ Engn & Technol, Dept Elect & Elect Engn, Dhaka 1000, Bangladesh
关键词
Quantum Well MOSFET; Strain; Delta Doping; III-V Semiconductors; C-V Characteristics;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this work, the Capacitance-Voltage(C-V) characteristics of a InxGa1-xAs/InAs/InxGa1-xAs Quantum-Well (QW) MOSFET is investigated. 1D coupled Schrodinger-Poisson equations are solved self consistently by Finite Element Method (FEM) using COMSOL coupled with MATLAB to extract the charge density profile and Capacitance-Voltage profile. Effects of strain in the In Ga1-xAs/InAs/InxGa1-xAs Quantum-Well channel are also investigated. At the same time, effects of various device and process parameters like dielectric material, channel thickness and doping density on the C-V characteristics are also explored. The extracted C-V profile is also compared with the results obtained using SILVACO ATLAS.
引用
收藏
页码:709 / 712
页数:4
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