Effects of the Hf content on the microstructure and magnetic properties of Co-Hf-Ta thin films

被引:0
|
作者
Huang, S. W. [1 ]
Lai, Y. T. [1 ]
Duh, J. G. [1 ]
机构
[1] Natl Tsing Hua Univ, Dept Mat Sci & Engn, Hsinchu, Taiwan
关键词
FABRICATION; PERFORMANCE; INDUCTOR;
D O I
10.1088/1742-6596/266/1/012032
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Effects of the Hf content in Co-Hf-Ta thin films on the microstructure and magnetic properties were investigated in this study. It was found that appropriate Hf addition can effectively refine the Co grain size. Co grain sizes sharply decreased from 50 nm down to 2.3 nm with increasing the Hf content from 1.02 at.% to 2.81 at.%, leading to the reduced magneto-crystalline anisotropy. The Co-Hf-Ta thin films with small Co grains reveal low anisotropy field, low coercivity, and high resistivity. By optimizing the Hf content, the film with Hf concentration of 2.81 at.% exhibits excellent soft magnetic properties: high saturation magnetization (4 pi M-S similar to 13.6 kG), and low coercivity (H-C similar to 0.6 Oe). The effective permeability of the film reaches 800 and remains constant up to 1 GHz.
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页数:5
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