Empirical Cluster Modeling Revisited

被引:0
|
作者
Pichler, Peter [1 ,2 ]
机构
[1] Fraunhofer Inst Integrated Syst & Device Technol, Schottkystr 10, D-91058 Erlangen, Germany
[2] Univ Erlangen Nurnberg, Chair Electron Devices, Cauerstr 6, D-91058 Erlangen, Germany
关键词
impurity clustering; empirical models; arsenic; silicon; solubility; process simulation; TCAD; SILICON; SIMULATION; DIFFUSION; DEFECTS; SI;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Impurities being present in a semiconductor in high concentrations may form agglomerates. Agglomeration usually demobilizes the impurities and, in case of dopants, also renders them electrically inactive. A standard approach in continuum process simulation assumes the formation of energetically favorable small clusters of size m. High numbers of m are used to mimic an often desired saturation of the concentration of unclustered impurity atoms with increasing total concentration. However, for systems far from equilibrium, potentiated high concentrations may lead to numerical problems. In this work, an alternative formulation is presented which features a saturation of the unclustered impurity concentration while introducing only one equation derived from Waite's theory of diffusion-limited reactions.
引用
收藏
页码:39 / 42
页数:4
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