SHADOW EDGE LITHOGRAPHY AND APPLICATION TO NANOFLUIDICS

被引：0
|
作者：
Yeo, Woon-Hong [1 ]
Lee, Dong Won
Lee, Kyong-Hoon
Chun, Jae-Hyun [1 ]
机构：
[1] Univ Washington, Dept Mech Engn, Seattle, WA 98195 USA
来源：
NEMB2010: PROCEEDINGS OF THE ASME FIRST GLOBAL CONGRESS ON NANOENGINEERING FOR MEDICINE AND BIOLOGY - 2010 | 2010年
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D O I：
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中图分类号：
R318 [生物医学工程];
学科分类号：
0831 ;
摘要：
引用
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页码：63 / 64
页数：2
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