Large-area plasmonic structures fabricated by laser nanopatterning and their applications

被引：2
|
作者：
Hong, M. H. [1 ,2 ]
Liu, C. H. [1 ]
Ma, F. [1 ]
Chen, Z. C. [1 ,2 ]
Luk'yanchuk, B. [2 ]
Shi, L. P. [2 ]
Chong, T. C. [1 ,2 ]
机构：
[1] Dept Elect & Comp Engn, 4 Engn Dr 3, Singapore 117576, Singapore
[2] Data Storage Inst, Singapore 117608, Singapore
来源：
LASER-BASED MICRO- AND NANOPACKAGING AND ASSEMBLY III | 2009年 / 7202卷
关键词：
Laser interference lithography; surface plasmon resonance; single layer plasmonic film and nanostructure; bimetallic layer plasmonic films and nanostructures; NANOSTRUCTURES;
D O I：
10.1117/12.810460
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Laser interference lithography is applied to fabricate large-area plasmonic nanostructures. This approach has the advantages of being non-contact process in air and able to achieve large-area and maskless nanolithography at a high speed with low system investment. Single layer Au or Ag noble metallic thin film and Ag/Au,Ag/Ni or Au/Ni bimetallic layer thin films are patterned into nano-dot, nano-rod and nano-nut arrays by laser interference lithography. Plasmonic effects of the fabricated metallic nanostructures are studied. Tunable and multi-peak surface plasmon resonances of these nanostructures can be obtained, which have potential applications in solar cells, bio-sensing and photonic circuits.
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页数：10
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