Sunlight photodegradation of marbofloxacin and enrofloxacin adsorbed on clay minerals

被引:23
|
作者
Sturini, Michela [1 ]
Speltini, Andrea [1 ]
Maraschi, Federica [1 ]
Rivagli, Elisa [1 ]
Pretali, Luca [2 ]
Malavasi, Lorenzo [1 ]
Profumo, Antonella [1 ]
Fasani, Elisa [1 ]
Albini, Angelo [1 ]
机构
[1] Univ Pavia, Dept Chem, I-27100 Pavia, Italy
[2] Parc Tecnol Padano, I-26900 Lodi, Italy
关键词
Fluoroquinolones; Clays; Photodegradation; Photoproducts; X-rays diffraction; PHOTOCATALYTIC DEGRADATION; AQUATIC ENVIRONMENT; TREATMENT PLANTS; FLUOROQUINOLONES; WATER; ADSORPTION; PHOTOLYSIS; SOIL; PHARMACEUTICALS; PHOTOCHEMISTRY;
D O I
10.1016/j.jphotochem.2014.11.015
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Fluoroquinolone antibiotics (FQs) are important "emerging" micropollutants, and their environmental diffusion is an issue of great concern. In this study, the photochemical degradation of marbofloxacin (MAR) and enrofloxacin (ENR) adsorbed on montmorillonite (MMT) and kaolinite (MO) clays was investigated. Being FQs photosensitive molecules, the sunlight-induced degradation of clay-adsorbed FQs and of their photoproducts was monitored as function of irradiation time. The photoproducts were identified by high performance liquid chromatography electrospray tandem mass spectrometry (HPLC-ESI-MS/MS) and the photochemical pathways have been elucidated. X-ray diffraction (XRD) has been employed to deeply study the solid-state photodegradation process of MAR and ENR on MMT. Interestingly, the XRD results clearly evidenced a significative variation of the interlayer spacing of MMT not only as function of FQs adsorbed amounts, but also in relationship with their photodegradation, not investigated by means of XRD as yet. The results confirmed that FQs adsorption is a bulk phenomenon that occurs in the interlayer spacing of the MMT structure; moreover, it was proved that sunlight largely degraded the adsorbed FQs, both on the external surface and in the interlayer spacing. (C) 2014 Elsevier B.V. All rights reserved.
引用
收藏
页码:103 / 109
页数:7
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