Fatigue effects in ferroelectric films studied by scanning force microscopy

被引：0
|
作者：
Gruverman, A [1 ]
Auciello, O
Tokumoto, H
机构：
[1] Natl Inst Adv Interdisciplinary Res, Joint Res Ctr Atom Technol, Tsukuba, Ibaraki 305, Japan
[2] MCNC, Elect Technol Div, Res Triangle Pk, NC 27709 USA
来源：
INTEGRATED FERROELECTRICS | 1998年 / 20卷 / 1-4期
关键词：
D O I：
10.1080/10584589808238794
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
[No abstract available]
引用
收藏
页码：263 / 264
页数：2
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