Accelerated reliability testing of Cu-Al bimetallic contact by a micropattern corrosion testing platform for wire bond device application

被引:4
|
作者
Kumar, Goutham Issac Ashok [1 ]
Alptekin, John [1 ]
Caperton, Joshua [1 ]
Salunke, Ashish [1 ]
Chyan, Oliver [1 ]
机构
[1] Univ North Texas, Dept Chem, Interfacial Elect & Mat Res Lab, Denton, TX 76203 USA
关键词
Packaging reliability; Wire bonding failures; Galvanic corrosion; Bimetallic contact;
D O I
10.1016/j.mex.2021.101320
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
Accelerated reliability testing of integrated circuit (IC) packages, such as wire-bonded devices, is a useful tool for predicting the lifetime corrosion behavior of real-world devices. Standard tests, such as highly accelerated stress test, involves subjecting an encapsulated device to high levels of humidity and high temperature (commonly 85-121 degrees C and 85-100% relative humidity). A major drawback of current reliability tests is that mechanistic information of what occurs between t = 0 and device failure is not captured. A novel method of in-situ investigation of the device corrosion process was developed to capture the real time mechanistic information not obtained in standard reliability testing [1]. The simple, yet effective methodology involves: Immersing a micropattern or device directly into contaminant-spiked aqueous solution, and observing its morphological changes under optical microscope paired with a camera. Short (2-48 h) time required for testing (compared to 24-300 h of standard tests). No need for humidity chambers. (C) 2021 The Authors. Published by Elsevier B.V.
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页数:6
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