Effects of Negative Bias Pulse on Characteristics of a-C:H Films Prepared by Plasma-Based Ion Implantation

被引:1
|
作者
Wang Yujiang [1 ,2 ]
Ma Xinxin [1 ]
Tang Guangze [1 ]
Sun Mingren [1 ]
Xu Binshi [2 ]
机构
[1] Harbin Inst Technol, State Key Lab Adv Welding Prod Technol, Harbin 150001, Peoples R China
[2] Acad Armed Force Engn, Nal Key Lab Mfg, Beijing 100072, Peoples R China
基金
中国国家自然科学基金;
关键词
PBII; DLC; Raman spectroscopy; X-ray photoelectron spectroscopy; HYDROGENATED AMORPHOUS-CARBON; DLC FILMS; TRIBOLOGICAL PROPERTIES; DEPOSITION; PBII; ACETYLENE; NITROGEN;
D O I
10.4028/www.scientific.net/MSF.675-677.1279
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A series of a-C:H films have been prepared by plasma-based ion implantation (PBII) with acetylene on AISI 321 substrates. The effect of negative bias pulse on the characteristics of these films was investigated. The structures of the films were analyzed by X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy. The surface hardness was measured by micro-indentation tests. The results indicated that the characteristics of these films are strongly depended on the negative bias pulse. When the bias pulse ranges from -10kV to -40kV, the films are typical diamond like carbon (DLC) films, while the films deposited at -5kV are polymer films. The peak intensity ratio of the D-band to that of the G-band (I-U/I-G) of the DLC films changes with the negative bias pulse. The minimum value of I-D/I-G(1.02) was gotten at -10kV.
引用
收藏
页码:1279 / +
页数:2
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