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Antireflective ZnSnO/Ag bilayer-based transparent source and drain electrodes for transparent thin film transistors
被引:25
|作者:
Choi, Kwang-Hyuk
[1
]
Koo, Hyun-Woo
[2
]
Kim, Tae-Woong
[2
]
Kim, Han-Ki
[1
]
机构:
[1] Kyung Hee Univ, Dept Adv Mat Engn Informat & Elect, Yongin 446701, Gyeonggi Di, South Korea
[2] Samsung Mobil Display Co Ltd, OLED Res Inst, Yongin 446701, Gyeonggi Di, South Korea
关键词:
ZNO;
D O I:
10.1063/1.4732091
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
We report on antireflective ZnSnO (ZTO)/Ag bilayer and ZTO/Ag/ZTO trilayer source/drain (S/D) electrodes for highly transparent ZTO channel-based thin film transistors (TFTs). Although both bilayer and trilayer films have a similar sheet resistance (3-5 Omega/sq), the ZTO/Ag bilayer is a more effective transparent S/D electrode for ZTO channel layer than the ZTO/Ag/ZTO trilayer S/D electrode, due to the direct contact of the Ag layer on the ZTO channel layer and a desirable oxide-metal-oxide multilayer structure for antireflection effects. ZTO channel-based all-transparent TFTs with ZTO/Ag bilayer S/D electrodes exhibited a saturation mobility of 4.54 cm(2)/Vs and a switching value (1.31 = V/decade), comparable to those of a ZTO channel-based TFT with metallic Ag S/D electrodes. This indicates that the antireflective ZTO/Ag bilayer is a promising transparent S/D electrode for use in all-transparent TFTs as a substitute for conventional opaque metal S/D electrodes. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4732091]
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