A correlation for interfacial area concentration in high void fraction flows in large diameter channels (vol 131, pg 172, 2015)

被引:0
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作者
Schlegel, J. P. [1 ]
Hibiki, T. [2 ]
机构
[1] Missouri Univ Sci & Technol, Dept Min & Nucl Engn, 222 Fulton Hall,301W 14th St, Rolla, MO 65409 USA
[2] Purdue Univ, Sch Nucl Engn, 400 Cent Dr, W Lafayette, IN 47907 USA
关键词
D O I
10.1016/j.ces.2020.115768
中图分类号
TQ [化学工业];
学科分类号
0817 ;
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页数:1
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