Improving Ion/Ioff in dual-gate graphene nanoribbon field-effect transistors using local uniaxial tensile strain

被引:6
|
作者
Moslemi, Mohammad Reza [1 ]
Moravej-Farshi, Mohammad Kazem [2 ]
Sheikhi, Mohammad Hossein [3 ]
机构
[1] Islamic Azad Univ, Dept Elect Engn, Zarghan Branch, Zarghan, Iran
[2] TMU, Fac Elect & Comp Engn, ADSL, Tehran 1411713116, Iran
[3] Shiraz Univ, Sch Elect & Comp Engn, Dept Elect & Commun, Shiraz, Iran
关键词
Graphene Nanoribbon Field Effect Transistor (GNRFET); Ambipolarity; Band to Band Tunneling; Drain Induced Barrier Lowering (DIBL); Non Equilibrium Green's Function (NEGF); Short Channel Effects; Uniaxial Tensile Strain;
D O I
10.1016/j.physe.2014.12.032
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In this work, we present the Dual-Gate Graphene Nano Ribbon Field Effect Transistor (DG-GNRFET) under local uniaxial strain in source and drain regions as a device suitable for switching applications. Our investigations are based on the 2D Poisson based on an atomistic mode-space approach and Schrodinger equations, within the Non-Equilibrium Green's (NEGF). We show a high on-current and on-off ratio which can be obtained using the combination of techniques such as applying uniaxial strain to the portion of channel/source regions and the gate overlap. We followed an optimization process to find the best performance of the device. Finally, the proposed device shows a higher on-current and on-off ratio becomes about 100 times greater than of the unstrained device. (C) 2015 Elsevier B.V. All rights reserved.
引用
收藏
页码:143 / 148
页数:6
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