Interreaction of Cu/Au thin films observed by high angle hollow cone darkfield electron microscopy

被引：1

作者：

Hartung, F ^{[1
]}

Ewert, JC ^{[1
]}

Dzick, J ^{[1
]}

Schmitz, G ^{[1
]}

机构：

[1] Univ Gottingen, Inst Met Phys, D-37073 Gottingen, Germany

来源：

SCRIPTA MATERIALIA | 1998年 / 39卷 / 01期

关键词：

D O I：

10.1016/S1359-6462(98)00135-3

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：79 / 85

页数：7

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