High-frequency deformation grating fabrication techniques and applications

被引:0
|
作者
Dai, Xianglu [1 ]
Li, Yanjie [2 ]
Xie, Huimin [1 ]
机构
[1] Tsinghua Univ, Dept Engn Mech, AML, Beijing 100084, Peoples R China
[2] Univ Jinan, Sch Civil Engn & Architecture, Jinan 250022, Peoples R China
基金
中国国家自然科学基金;
关键词
deformation grating; holographic photolithography; electron beam lithography (EBL); focused ion beam (FIB); nano-imprint lithography (NIL); MOIRE METHOD;
D O I
10.1117/12.2074671
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
The rapid development of micro-electronics and micro-nano material engineering make it an urgent task to characterize the mechanical properties of micro-device and micro-nano material accurately. Due to the advantages of high precision, high sensitivity and full field measurement, moire method has been applied in the micro-deformation measurement widely. Since the grating is the indispensable deformation sensor of moire method, how to fabricate high frequency grating with high quality is the key problem to solve for moire method. In this paper, some fabrication techniques developed recently with their applications will be summarized, including holographic photolithography, electron beam lithography (EBL), focused ion beam (FIB) and nano-imprint lithography(NIL), aiming to popularize the applications of moire method in the micro-deformation measurement and provide some valuable guidelines on how to choose a proper fabrication technique.
引用
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页数:11
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