New concept for In-Line OLED manufacturing

A new concept of a vertical In-Line deposition machine for large area white OLED production has been developed. The concept targets manufacturing on large substrates (>= Gen 4, 750 x 920 mm(2)) using linear deposition source achieving a total material utilization of >= 50 % and tact time down to 80 seconds. The continuously improved linear evaporation sources for the organic material achieve thickness uniformity on Gen 4 substrate of better than +/- 3 % and stable deposition rates down to less than 0.1 nm m/min and up to more than 100 nm m/min. For Lithium-Fluoride but also for other high evaporation temperature materials like Magnesium or Silver a linear source with uniformity better than +/- 3 % has been developed. For Aluminum we integrated a vertical oriented point source using wire feed to achieve high (> 150 nm m/min) and stable deposition rates. The machine concept includes a new vertical vacuum handling and alignment system for Gen 4 shadow masks. A complete alignment cycle for the mask can be done in less than one minute achieving alignment accuracy in the range of several 10 mu m.