Super-resolution near-field structure and signal enhancement by surface plasmons

被引：33
|
作者：
Tominaga, J
Kim, J
Fuji, H
Büchel, D
Kikukawa, T
Men, L
Fukuda, H
Sato, A
Nakano, T
Tachibana, A
Yamakawa, Y
Kumagai, M
Fukaya, T
Atoda, N
机构：
[1] Natl Inst Adv Interdisciplinary Res, Adv Opt Memory Grp, Tsukuba, Ibaraki 3058562, Japan
[2] Sharp Co Ltd, Adv Technol Res Lab, Tenri, Nara 6328567, Japan
[3] TDK Co, Data Storage Technol Ctr, Nagano 3850009, Japan
[4] Minolta Co, Takatsuka Lab, Takatsuki, Osaka 5698503, Japan
[5] Pioneer Co, Corp Res & Dev Lab, Kawagoe, Saitama 3502288, Japan
[6] Pulstec Ind Co, Hosoe Technol Ctr, Shizuoka 4311304, Japan
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2001年 / 40卷 / 3B期
关键词：
super-RENS; near-field recording; surface plasmons; phase-change recording; silver oxide;
D O I：
10.1143/JJAP.40.1831
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
We describe surface plasmon enhancement by near-field interaction with Ag-scattering centers, By inserting mark trains between two Ag-scattering centers, the near-field signals were further enhanced in a super-resolution near-field structure. Observing the enhancement in more detail. it was found that surface plasmons are generated along the mark trains and are dispersed in a range of 1 mum along the marks and 40-50 nm normal to the multilayer stack.
引用
收藏
页码：1831 / 1834
页数：4
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