Novel periodic microstructures fabricated by multi-exposure two-beam interference lithography

被引：0
|
作者：
Bai, Yinbing [1 ]
Zhang, A. Ping [1 ]
机构：
[1] Zhejiang Univ, Ctr Opt & Electromagnet Res, State Key Lab Modern Opt Instrumentat, Hangzhou 310058, Zhejiang, Peoples R China
来源：
OPTICAL SENSORS AND BIOPHOTONICS II | 2011年 / 7990卷
关键词：
Microstructure fabrication; lithography; micro-optical devices; optical design and fabrication; PHOTONIC CRYSTALS; SURFACE; LIGHT; LASER; EMISSION; CHIP;
D O I：
10.1117/12.888450
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
We present some novel periodic structures with different internal nanopatterns based on multi-exposure two-beam interference lithography. Two-dimensional quasi-crystal structures are fabricated with precisely control of exposure directions and doses as well as the total number of exposures. Experimental fabrication of microstructures are demonstrated and comparied with numerical simulations of intensity distributions. The size of the fabricated samples is around 1 square centimeter. The diffraction spectra of the fabricated samples are measured and tested. The experiment results show such a fabrication technology is very promising for making diverse large-area microstructures with complex internal nanopatterns.
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页数：8
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