An analysis of the instability phenomena of a low-current vacuum arc for copper cathodes

被引:10
|
作者
Mungkung, N [1 ]
Morimiya, S [1 ]
Kamikawaji, T [1 ]
机构
[1] Nippon Inst Technol, Minami, Saitama 3458501, Japan
关键词
cathode spot; copper; instability; low current; vacuum arc;
D O I
10.1109/TPS.2003.818422
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
A cathode spot model is used to analyze the instability phenomena of a vacuum arc. The current below which no real solution exists is believed to be an unstable region. When the current decreases below 19 A, the electrons returning to the sheath region from the plasma region were found to dominate over the positive ions and, thus, the cathode electric field has an imaginary solution. An electrostatic probe was used to confirm these findings, and the analytical results were similar to measurement results, The present cathode spot model may be valid for volatile materials.
引用
收藏
页码:963 / 967
页数:5
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