Model predictive control of a CVD reactor for production of polysilicon rods

被引:17
|
作者
Vigano, Luca [1 ]
Vallerio, Mattia [1 ]
Manenti, Flavio [1 ]
Lima, Nadson M. N. [2 ]
Linan, Lamia Zuniga [2 ]
Manenti, Giovanni [3 ]
机构
[1] Politecn Milan, CMIC Dept Giulio Natta, Piazza Leonardo da Vinci 32, I-20133 Milan, Italy
[2] State Univ Campinas UNICAMP, Dept Chem Proc, Campinas, SP, Brazil
[3] FBM Hudson Italiana SpA, WHB R&D Dept, Terno Disola, Italy
关键词
CHEMICAL-VAPOR-DEPOSITION; SILICON;
D O I
10.3303/CET1021088
中图分类号
X [环境科学、安全科学];
学科分类号
08 ; 0830 ;
摘要
Production of polysilicon plays a key role in the development of hi-tech and renewable energy industry. Massive production is obtained by chemical vapor deposition (CVD) in semi-batch reactors, traditionally called Siemens reactors, where silicon rods are grown. Following recent increase in market demand for polysilicon, a fine process control on industrial processes for improving production yield and reducing energy consumption is required. In this work, a technique for a real-time model-based predictive control applied to a laboratory-scale Siemens reactor is presented; a lumped model is used for describing the CVD process. Discussion is based on numerical results.
引用
收藏
页码:523 / 528
页数:6
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