Electrodeposited CuInSe2 thin film junctions

被引:0
|
作者
Raffaelle, RP [1 ]
Mantovani, JG [1 ]
Bailey, SG [1 ]
Hepp, AF [1 ]
Gordon, EM [1 ]
Haraway, R [1 ]
机构
[1] Florida Inst Technol, Melbourne, FL 32901 USA
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D O I
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中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
We have investigated thin films and junctions based on copper indium diselenide (CIS) which have been grown by electrochemical deposition. CIS is a leading candidate for use in polycrystalline thin film photovoltaic solar cells. Electrodeposition is a cost-effective method for producing thin-film CIS. We have produced both p and n type CIS thin films from the same aqueous solution by simply varying the deposition potential. A CIS pn junction was deposited using a step-function potential. Stoichiometry of the single layer films was determined by energy dispersive spectroscopy. Carrier densities of these films increased with deviation from stoichiometry, as determined by the capacitance versus voltage dependence of Schottky contacts. Optical bandgaps for the single layer films as determined by transmission spectrocopy were also found to increase with deviation from stoichiometry. Rectifying current versus voltage characteristics were demonstrated for the Schottky barriers and for the pn junction.
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页码:383 / 388
页数:6
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