LCD glass cleaning by atmospheric pressure glow discharge plasma

被引:4
|
作者
Cho, JH
Kim, JW
Kim, KS
Lee, WY
Kim, SH
Choi, WY
机构
[1] Changjo Engn Co Ltd, Hwaseong, South Korea
[2] Korea Univ Tech & Educ, Cheonan, South Korea
[3] Kangnung Natl Univ, Kangnung, South Korea
来源
关键词
LCD; ITO; atmospheric pressure; glow plasma; cleaning;
D O I
10.4028/www.scientific.net/KEM.297-300.2351
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We report on a novel method for the surface modification of indium tin oxide (ITO) in LCD glass by direct exposure to a dielectric barrier discharge (DBD) at atmospheric pressure and room temperature. To remove the organic contaminants from the surfaces of ITO film in LCD glass, the atmospheric pressure RF glow discharge plasma was used. Argon (Ar) and oxygen (O-2) were used as the carrier gas and reactive gas, respectively. The addition of O-2 gas to Ar decreased the contact angle of water and increased the surface cleaning rate due to the increase of oxygen radicals in the plasma. The chemical characteristics of ITO surface after the plama treatment were investigated using X-ray photoelectron spectroscopy (XPS), and new carboxyl group bond was produced. The contact angle of 64 degrees before the plasma treatment was decreased to 7 degrees in the processing condition with oxygen flow rate of 50 sccm, treatment speed of 100mm/sec, and input power of 300W. These hydrophilic effect will be very useful in the manufacturing processes of LCD glass.
引用
收藏
页码:2351 / 2355
页数:5
相关论文
共 50 条
  • [1] Metal leadframe surface cleaning prior to electroplating by atmospheric pressure glow discharge plasma
    Cho, JH
    Kang, BK
    Kim, KS
    Jin, KB
    Kim, SH
    Choi, WY
    [J]. ADVANCES IN FRACTURE AND STRENGTH, PTS 1- 4, 2005, 297-300 : 869 - 874
  • [2] THE CLEANING OF GLASS IN A GLOW DISCHARGE
    HOLLAND, L
    [J]. BRITISH JOURNAL OF APPLIED PHYSICS, 1958, 9 (10): : 410 - 415
  • [3] Operating characteristics of a glow plasma discharge at atmospheric pressure
    Sugimoto, S
    Norikane, S
    Takehara, A
    Goto, S
    [J]. ICPP 96 CONTRIBUTED PAPERS - PROCEEDINGS OF THE 1996 INTERNATIONAL CONFERENCE ON PLASMA PHYSICS, VOLS 1 AND 2, 1997, : 1826 - 1829
  • [4] Plasma sterilization using glow discharge at atmospheric pressure
    Akitsu, T
    Ohkawa, H
    Tsuji, M
    Kimura, H
    Kogoma, M
    [J]. SURFACE & COATINGS TECHNOLOGY, 2005, 193 (1-3): : 29 - 34
  • [5] A uniform glow discharge plasma source at atmospheric pressure
    Moon, SY
    Choe, W
    Kang, BK
    [J]. APPLIED PHYSICS LETTERS, 2004, 84 (02) : 188 - 190
  • [6] Glow plasma jet - experimental study of a transferred atmospheric pressure glow discharge
    Guerra-Mutis, MH
    Pelaez, CV
    Cabanzo, R
    [J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 2003, 12 (02): : 165 - 169
  • [7] Exploration to generate atmospheric pressure glow discharge plasma in air
    Liu, Wenzheng
    Ma, Chuanlong
    Zhao, Shuai
    Chen, Xiaozhong
    Wang, Tahan
    Zhao, Luxiang
    Li, Zhiyi
    Niu, Jiangqi
    Zhu, Liying
    Chai, Maolin
    [J]. PLASMA SCIENCE & TECHNOLOGY, 2018, 20 (03)
  • [8] Plasma Reduction of Graphene Oxide in Atmospheric Pressure Glow Discharge
    Seo, Ho Seok
    Lee, Won Gyu
    [J]. SCIENCE OF ADVANCED MATERIALS, 2017, 9 (10) : 1854 - 1858
  • [9] Exploration to generate atmospheric pressure glow discharge plasma in air
    刘文正
    马传龙
    赵帅
    陈晓中
    王踏寒
    赵潞翔
    李治一
    牛江奇
    祝莉莹
    柴茂林
    [J]. Plasma Science and Technology, 2018, 20 (03) - 66
  • [10] Exploration to generate atmospheric pressure glow discharge plasma in air
    刘文正
    马传龙
    赵帅
    陈晓中
    王踏寒
    赵潞翔
    李治一
    牛江奇
    祝莉莹
    柴茂林
    [J]. Plasma Science and Technology, 2018, (03) : 53 - 66