Photoinduced Field-Effect Passivation from Negative Carrier Accumulation for High-Efficiency Silicon/Organic Heterojunction Solar Cells

被引:14
|
作者
Liu, Zhaolang [1 ,2 ]
Yang, Zhenhai [1 ]
Wu, Sudong [1 ]
Zhu, Juye [1 ]
Guo, Wei [1 ]
Sheng, Jiang [1 ]
Ye, Jichun [1 ]
Cui, Yi [3 ]
机构
[1] Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China
[2] Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200072, Peoples R China
[3] Stanford Univ, Dept Mat Sci & Engn, Stanford, CA 94305 USA
基金
中国国家自然科学基金;
关键词
photoinduced negative carrier accumulation; photoactive field-effect passivation; antireflective coating; synergistic effect; heterojunction solar cells; OPTICAL-PROPERTIES; THIN-FILMS; TIO2; PEDOTPSS; NANOPARTICLES; LIGHT; LAYER; WATER;
D O I
10.1021/acsnano.7b07222
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Carrier recombination and light management of the dopant-free silicon/organic heterojunction solar cells (HSCs) based on poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate) (PEDOT:PSS) are the critical factors in developing high-efficiency photovoltaic devices. However, the traditional passivation technologies can hardly provide efficient surface passivation on the front surface of Si. In this study, a photoinduced electric field was induced in a bilayer antireflective coating (ARC) of polydimethylsiloxane (PDMS) and titanium oxide (TiO2) films, due to formation of an accumulation layer of negative carriers (O-2(-) species) under UV (sunlight) illumination. This photoinduced field not only suppressed the silicon surface recombination but also enhanced the built-in potential of HSCs with 84 mV increment. In addition, this photoactive ARC also displayed the outstanding light-trapping capability. The front PEDOT:PSS/Si HSC with the saturated O-2(-) received a champion PCE of 15.51% under AM 1.5 simulated sunlight illumination. It was clearly demonstrated that the photoinduced electric field was a simple, efficient, and low-cost method for the surface passivation and contributed to achieve a high efficiency when applied in the Si/PEDOT:PSS HSCs.
引用
收藏
页码:12687 / 12695
页数:9
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