State of the art of metal oxide memristor devices

被引:179
|
作者
Mohammad, Baker [1 ]
Jaoude, Maguy Abi [1 ]
Kumar, Vikas [1 ]
Al Homouz, Dirar Mohammad [1 ]
Abu Nahla, Heba [1 ]
Al-Qutayri, Mahmoud [1 ]
Christoforou, Nicolas [1 ]
机构
[1] Khalifa Univ Sci Technol & Res, POB 127788, Abu Dhabi, U Arab Emirates
关键词
memory technology; memristor; RRAM; thin film; RESISTIVE SWITCHING CHARACTERISTICS; HIGH-PERFORMANCE; BILAYER STRUCTURE; WORK FUNCTION; MEMORY; RESISTANCE; UNIPOLAR; BIPOLAR; BEHAVIORS; FILM;
D O I
10.1515/ntrev-2015-0029
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Memristors are one of the emerging technologies that can potentially replace state-of-the-art integrated electronic devices for advanced computing and digital and analog circuit applications including neuromorphic networks. Over the past few years, research and development mostly focused on revolutionizing the metal oxide materials, which are used as core components of the popular metal-insulator-metal memristors owing to their highly recognized resistive switching behavior. This paper outlines the recent advancements and characteristics of such memristive devices, with a special focus on (i) their established resistive switching mechanisms and (ii) the key challenges associated with their fabrication processes including the impeding criteria of material adaptation for the electrode, capping, and insulator component layers. Potential applications and an outlook into future development of metal oxide memristive devices are also outlined.
引用
收藏
页码:311 / 329
页数:19
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