OFI argon excimer amplifier for intense subpicosecond VUV pulse generation

被引：0

作者：

Kaku, M. ^{[1
]}

Kubodera, S. ^{[1
]}

Oda, K. ^{[1
]}

Katto, M. ^{[2
]}

Yokotani, A. ^{[2
]}

Miyanaga, N. ^{[3
]}

Mima, K. ^{[3
]}

机构：

[1] Miyazaki Univ, Dept Elect & Elect Engn, Gakuen Kibanadai Nishi 1-1, Miyazaki 8892192, Japan

[2] Miyazaki Univ, Cooperat Res Ctr, Miyazaki 8892192, Japan

[3] Osaka Univ, Inst Laser Engn, Suita, Osaka 5650871, Japan

来源：

XVII INTERNATIONAL SYMPOSIUM ON GAS FLOW, CHEMICAL LASERS, AND HIGH-POWER LASERS | 2009年 / 7131卷

关键词：

VUV laser; high intensity laser; excimer laser; OFI plasma;

D O I：

10.1117/12.820060

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We have demonstrated an OFI Ar-2* excimer VUV amplifier at 126 nm pumped by a high-intensity laser in the table top size. We observed the Ar-2* excimer emission centered at 126 nm with the spectral bandwidth of 10 nm (FWHM), which was produced in the OFI plasma. Significant amplification was observed inside the OFI Ar-2* excimer as a result of the optical feedback provided by a VUV reflector. The gain-length product of 5.6 was observed at the Ar pressure of 11 atm. The population inversion density on the order of 10(17) cm(-3) was evaluated inside the OFI plasma, which would be sufficient for the amplification of a subpicosecond VUV pulse at 126 nm produced by the harmonic generation.

引用

页数：6

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