Highly integrated field emitter arrays fabricated by transfer mold technique

被引:17
|
作者
Nakamoto, M [1 ]
Fukuda, K [1 ]
机构
[1] Toshiba Co Ltd, Ctr Corp Res & Dev, Saiwai Ku, Kawasaki, Kanagawa 2128582, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2003年 / 42卷 / 6A期
关键词
field emitter arrays; FEAs; field electron emission; transfer mold technique; vacuum microelectronics; vacuum microelectronic switching devices;
D O I
10.1143/JJAP.42.3611
中图分类号
O59 [应用物理学];
学科分类号
摘要
Highly integrated field emitter arrays (FEAs) have been fabricated by the transfer mold technique to obtain highly uniform and stable field emission for highly efficient and reliable vacuum microelectronic devices. Transfer mold Mo FEAs containing 9,400,000 emitter tips with high emitter density of 7,840,000 tips/cm(2) have demonstrated a low value of less than 0.7%. Highly uniform, and flickerless fluorescence has been observed in the entire area of the fluorescent screen corresponding to the FEAs. The principle of the vacuum microelectronic switching devices has been proposed and experimentally verified by applying a high anode voltage of +/- 1 kV, which will be capable of decreasing the size and the electric power loss of the high voltage electric power converters using conventional semiconductor devices such as light-triggered thyristors (LTT) and gate turn off thyristors (GTO) to less than 1/100 and 1/10, respectively. [DOI: 10.1143/JJAP.42.3611].
引用
收藏
页码:3611 / 3615
页数:5
相关论文
共 50 条
  • [1] SiC field emitter arrays fabricated by transfer mold technique
    Górecka-Drzazga, A
    Dziuban, J
    Prociów, E
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2000, 18 (02): : 1115 - 1118
  • [3] Emission characteristic of diamond-tip field emitter arrays fabricated by transfer mold technique
    Kim, S
    Ju, BK
    Lee, YH
    Park, BS
    Baik, YJ
    Lim, S
    Oh, MH
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1997, 15 (02): : 499 - 502
  • [4] Low-voltage field emitter arrays fabricated by advanced transfer metal mold technique
    Nakamoto, M
    Fukuda, K
    Higa, M
    Inoue, A
    Takahashi, F
    Honda, S
    TECHNICAL DIGEST OF THE 16TH INTERNATIONAL VACUUM MICROELECTRONICS CONFERENCE, 2003, : 185 - 186
  • [5] Study on the diamond field emitter fabricated by transfer mold technique
    Ju, BK
    Kim, SJ
    Jung, JH
    Lee, YH
    Park, BS
    Baik, YJ
    Lim, SK
    Oh, MH
    FLAT PANEL DISPLAY MATERIALS II, 1997, 424 : 399 - 402
  • [6] Si field emitter arrays fabricated by anodization and transfer technique
    Higa, K
    Nishii, K
    Asano, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (12B): : 7741 - 7744
  • [7] Si field emitter arrays fabricated by anodization and transfer technique
    Kyushu Inst of Technology, Fukuoka, Japan
    Jpn J Appl Phys Part 1 Regul Pap Short Note Rev Pap, 12 B (7741-7744):
  • [8] Field electron emission from LaB6 and TiN emitter arrays fabricated by transfer mold technique
    Nakamoto, M
    Fukuda, K
    APPLIED SURFACE SCIENCE, 2002, 202 (3-4) : 289 - 294
  • [9] Low operation voltage field emitter arrays using low work function materials fabricated by transfer mold technique.
    Nakamoto, M
    Hasegawa, T
    Ono, T
    Sakai, T
    Sakuma, N
    IEDM - INTERNATIONAL ELECTRON DEVICES MEETING, TECHNICAL DIGEST 1996, 1996, : 297 - 300
  • [10] Self-aligned Si gate field emitter arrays using the transfer mold technique
    Sakai, Tadashi
    Ono, Tomio
    Nakamoto, Masayuki
    Sakuma, Naoshi
    Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, 1998, 16 (02):