Controlled deposition of size-selected metal nanoclusters on prepatterned substrate

An endeavor of organizing Cu nano-particles of controlled size in ordered arrays at room temperature is reported. This involves the guided deposition of size-selected nanoparticles otherwise known as nanoclusters via periodic modulation of the substrate surface. Ultra-high vacuum compatible magnetron-based gas-aggregation type source combined with a quadrupole mass filter (QMF) has been employed to produce the size-selected nanoclusters whereas the surface modulations (ripples) in the nanoscale are induced by low energy oblique angle ion beam irradiation. Morphological aspects of deposited nanoclusters and the substrates were characterized by high-resolution scanning electron microscopy (HRSEM) and atomic force microscopy (AFM). The chemical composition of the deposited nanoclusters was characterized by X-ray photoelectron spectroscopy. The alignment of size-selected metal nanoclusters along the substrate-patterns is observed. Depending upon deposition conditions quality of the organization varies. The optimum angle of deposition for the improved alignment depends on the pattern parameters of the substrate.