Internal friction and Young's modulus of the nc-TiN/a-Si3N4 films prepared by reactive magnetron sputtering method

被引：0

作者：

Li, ZS ^{[1
]}

Wang, XP ^{[1
]}

Fang, QF ^{[1
]}

Veprek, S ^{[1
]}

Li, SZ ^{[1
]}

机构：

[1] Tech Univ Munich, Inst Chem Inorgan Mat, D-85747 Munich, Germany

来源：

ACTA METALLURGICA SINICA | 2003年 / 39卷 / 11期

关键词：

nc-TiN/a-Si3N4; film; internal friction; Young's modulus; unstable interface;

D O I：

暂无

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

The vibrating reed technique is used to evaluate the Young's modulus and internal friction of nc-TiN/a-Si3N4 superhard films. A relaxation peak is observed around 280 degreesC in the as-received film. With increasing the annealing temperature, this peak weakens and the Young's modulus at room temperature changes slightly. After annealing at 750 degreesC, this peak disappears while the modulus increases from the value of 430 GPa in the un-annealed status to a value of 530 GPa. This internal friction peak is suggested to be associated with the relaxation process of the unstable interface.

引用

页码：1193 / 1196

页数：4

共 10 条

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