Electric field penetration in Au/Nb: SrTiO3 Schottky junctions probed by bias-dependent internal photoemission

被引:31
|
作者
Hikita, Y. [1 ]
Kawamura, M. [1 ]
Bell, C. [1 ]
Hwang, H. Y. [1 ,2 ,3 ,4 ]
机构
[1] Univ Tokyo, Dept Adv Mat Sci, Chiba 2778561, Japan
[2] Japan Sci & Technol Agcy, Kawaguchi, Saitama 3320012, Japan
[3] Stanford Univ, Dept Appl Phys, Stanford, CA 94305 USA
[4] Stanford Univ, Stanford Inst Mat & Energy Sci, Stanford, CA 94305 USA
关键词
THIN DIELECTRIC STRUCTURES; TRANSITION-METAL OXIDES; STRONTIUM TITANATE; TUNNEL JUNCTIONS; BARRIER HEIGHT; TEMPERATURE; CAPACITANCE; CONSTANT; SURFACE;
D O I
10.1063/1.3589375
中图分类号
O59 [应用物理学];
学科分类号
摘要
Electric field penetration into the metallic side of a Schottky junction is in principle a universal phenomenon, the magnitude of which increases with the semiconductor permittivity. Here, we quantitatively probe this effect using bias-dependent internal photoemission spectroscopy at the Schottky junction between a large dielectric permittivity semiconductor SrTiO3 and gold. A clear linear reduction in the barrier height with increasing interface electric field was observed, highlighting the importance of field penetration into the gold. The interfacial permittivity of SrTiO3 at the interface is reduced from the bulk value, reflecting intrinsic suppression at the interface. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3589375]
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页数:3
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