Effect of nitrogen flow rate on properties of nanostructured TiZrN thin films produced by radio frequency magnetron sputtering

被引：41

作者：

Lin, Yu-Wei ^{[1
,2
]}

Huang, Jia-Hong ^{[1
]}

Yu, Ge-Ping ^{[1
,3
]}

机构：

[1] Natl Tsing Hua Univ, Dept Engn & Syst Sci, Hsinchu 300, Taiwan

[2] Instrument Technol Res Ctr, Hsinchu 300, Taiwan

[3] Natl Tsing Hua Univ, Inst Nucl Engn & Sci, Hsinchu 300, Taiwan

来源：

THIN SOLID FILMS | 2010年 / 518卷 / 24期

关键词：

(Ti; Zr)N; Nitrogen flow rate; Magnetron sputtering; MECHANICAL-PROPERTIES; TIN COATINGS; TITANIUM NITRIDE; ZRN; DEPOSITION; CARBIDE; SYSTEM; GROWTH; ARC; AL;

D O I：

10.1016/j.tsf.2010.04.099

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The effect of nitrogen flow rate on structure and properties of (Ti,Zr)N thin films was investigated in the study. Two types of (Ti,Zr)N thin films were found with different nitrogen flow rates, one is the single-phase solid solution of (Ti,Zr)N that appeared for nitrogen flow rates of 2-7 sccm, the other one is the phase of both (Ti,Zr)N and TiZr mixture for the lower nitrogen flow rates of 1 sccm. The grain size of the films was also determined by X-ray diffraction, and the size was less than 20 nm. The (Ti,Zr)N films show excellent hardness ranging from 35.5 to 37.5 GPa with exhibiting (111) preferred orientation. Crown Copyright (C) 2010 Published by Elsevier B.V. All rights reserved.

引用

页码：7308 / 7311

页数：4

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