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Ultraviolet emission lifetime in Si and Ge oxygen deficient centers in silica
被引:10
|作者:
Cannas, M
Agnello, S
Boscaino, R
Gelardi, FM
Grandi, S
Mustarelli, PC
机构:
[1] INFM, I-90123 Palermo, Italy
[2] Dipartimento Sci Fis & Astron, I-90123 Palermo, Italy
[3] Univ Pavia, Dept Phys Chem, I-27100 Pavia, Italy
关键词:
D O I:
10.1016/S0022-3093(03)00192-3
中图分类号:
TQ174 [陶瓷工业];
TB3 [工程材料学];
学科分类号:
0805 ;
080502 ;
摘要:
We have measured the temperature dependence, in the range 10-295 K, of the lifetimes of the ultraviolet emissions associated with twofold coordinated Si and Ge, in pure and Ge-doped silica under excitation by synchrotron radiation. The Si-related fluorescence, centered at 4.4 eV, has a single exponential decay and its lifetime decreases from 4.0+/-0.2 to 3.5+/-0.2 ns on increasing the temperature. The luminescence at 4.2 eV, associated with the Ge defect, decays with a single exponential dependence below 150 K and with a more complex dependence at higher temperatures, its lifetime reducing from 7.8+/-0.2 to 3.4+/-0.2 ns. These features give evidence of the effectiveness of the thermally activated intersystem crossing in the relaxation of the excited singlet states, which is larger in the Ge-related center. (C) 2003 Elsevier B.V. All rights reserved.
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页码:129 / 133
页数:5
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