Improved endurance of resistive switching TiO2 thin film by hourglass shaped Magneli filaments
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作者:
Kim, Gun Hwan
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Seoul Natl Univ, Dept Mat Sci & Engn, WCU Hybrid Mat Program, Seoul 151744, South Korea
Seoul Natl Univ, Interuniv Semicond Res Ctr, Seoul 151744, South KoreaSeoul Natl Univ, Dept Mat Sci & Engn, WCU Hybrid Mat Program, Seoul 151744, South Korea
Kim, Gun Hwan
[1
,2
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Lee, Jong Ho
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Seoul Natl Univ, Dept Mat Sci & Engn, WCU Hybrid Mat Program, Seoul 151744, South Korea
Seoul Natl Univ, Interuniv Semicond Res Ctr, Seoul 151744, South KoreaSeoul Natl Univ, Dept Mat Sci & Engn, WCU Hybrid Mat Program, Seoul 151744, South Korea
Lee, Jong Ho
[1
,2
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Seok, Jun Yeong
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Seoul Natl Univ, Dept Mat Sci & Engn, WCU Hybrid Mat Program, Seoul 151744, South Korea
Seoul Natl Univ, Interuniv Semicond Res Ctr, Seoul 151744, South KoreaSeoul Natl Univ, Dept Mat Sci & Engn, WCU Hybrid Mat Program, Seoul 151744, South Korea
Seok, Jun Yeong
[1
,2
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Song, Seul Ji
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Seoul Natl Univ, Dept Mat Sci & Engn, WCU Hybrid Mat Program, Seoul 151744, South Korea
Seoul Natl Univ, Interuniv Semicond Res Ctr, Seoul 151744, South KoreaSeoul Natl Univ, Dept Mat Sci & Engn, WCU Hybrid Mat Program, Seoul 151744, South Korea
Song, Seul Ji
[1
,2
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Yoon, Jung Ho
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Seoul Natl Univ, Dept Mat Sci & Engn, WCU Hybrid Mat Program, Seoul 151744, South Korea
Seoul Natl Univ, Interuniv Semicond Res Ctr, Seoul 151744, South KoreaSeoul Natl Univ, Dept Mat Sci & Engn, WCU Hybrid Mat Program, Seoul 151744, South Korea
Yoon, Jung Ho
[1
,2
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Yoon, Kyung Jean
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Seoul Natl Univ, Dept Mat Sci & Engn, WCU Hybrid Mat Program, Seoul 151744, South Korea
Seoul Natl Univ, Interuniv Semicond Res Ctr, Seoul 151744, South KoreaSeoul Natl Univ, Dept Mat Sci & Engn, WCU Hybrid Mat Program, Seoul 151744, South Korea
Yoon, Kyung Jean
[1
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Lee, Min Hwan
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机构:
Seoul Natl Univ, Dept Mat Sci & Engn, WCU Hybrid Mat Program, Seoul 151744, South Korea
Seoul Natl Univ, Interuniv Semicond Res Ctr, Seoul 151744, South KoreaSeoul Natl Univ, Dept Mat Sci & Engn, WCU Hybrid Mat Program, Seoul 151744, South Korea
Lee, Min Hwan
[1
,2
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Kim, Kyung Min
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Seoul Natl Univ, Dept Mat Sci & Engn, WCU Hybrid Mat Program, Seoul 151744, South Korea
Seoul Natl Univ, Interuniv Semicond Res Ctr, Seoul 151744, South KoreaSeoul Natl Univ, Dept Mat Sci & Engn, WCU Hybrid Mat Program, Seoul 151744, South Korea
Kim, Kyung Min
[1
,2
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Lee, Hyung Dong
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Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USASeoul Natl Univ, Dept Mat Sci & Engn, WCU Hybrid Mat Program, Seoul 151744, South Korea
Lee, Hyung Dong
[3
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Ryu, Seung Wook
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Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USASeoul Natl Univ, Dept Mat Sci & Engn, WCU Hybrid Mat Program, Seoul 151744, South Korea
Ryu, Seung Wook
[3
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Park, Tae Joo
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机构:
Hanyang Univ, Dept Mat Engn, Ansan 426791, South KoreaSeoul Natl Univ, Dept Mat Sci & Engn, WCU Hybrid Mat Program, Seoul 151744, South Korea
Park, Tae Joo
[4
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Hwang, Cheol Seong
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机构:
Seoul Natl Univ, Dept Mat Sci & Engn, WCU Hybrid Mat Program, Seoul 151744, South Korea
Seoul Natl Univ, Interuniv Semicond Res Ctr, Seoul 151744, South KoreaSeoul Natl Univ, Dept Mat Sci & Engn, WCU Hybrid Mat Program, Seoul 151744, South Korea
Hwang, Cheol Seong
[1
,2
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机构:
[1] Seoul Natl Univ, Dept Mat Sci & Engn, WCU Hybrid Mat Program, Seoul 151744, South Korea
[2] Seoul Natl Univ, Interuniv Semicond Res Ctr, Seoul 151744, South Korea
[3] Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USA
[4] Hanyang Univ, Dept Mat Engn, Ansan 426791, South Korea
A modified biasing scheme was adopted to improve the electrical endurance characteristics of conducting filamentary resistive switching (RS) in a Pt/TiO2/Pt RS cell. The modified bias scheme included the application of bias voltages with alternating polarity, even though RS proceeds in non-polar mode, which results in the stable distribution of each resistance states as well as improved endurance. This was attributed to the minimized consumption of oxygen ions in the TiO2 film, which can be induced by the formation of hourglass-shaped conducting filament (HSCF). The presence of a HSCF was confirmed by high-resolution transmission electron microscopy. (C) 2011 American Institute of Physics. [doi:10.1063/1.3600784]
机构:
Korea Univ, Dept Nanosemicond Engn, Seoul 136701, South KoreaKorea Univ, Dept Nanosemicond Engn, Seoul 136701, South Korea
Oh, Sang Chul
Jung, Ho Yong
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机构:
Korea Univ, Dept Mat Sci & Engn, Seoul 136701, South Korea
Hynix Semicond Inc, R&D Div, Cheongju 361725, South KoreaKorea Univ, Dept Nanosemicond Engn, Seoul 136701, South Korea
Jung, Ho Yong
Lee, Heon
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机构:
Korea Univ, Dept Nanosemicond Engn, Seoul 136701, South Korea
Korea Univ, Dept Mat Sci & Engn, Seoul 136701, South KoreaKorea Univ, Dept Nanosemicond Engn, Seoul 136701, South Korea