Plasma emission spectroscopy of solids irradiated by intense XUV pulses from a free electron laser

被引：5

作者：

Dzelzainis, T. W. J. ^{[1
]}

Chalupsky, J. ^{[2
]}

Fajardo, M. ^{[3
]}

Faeustlin, R. ^{[4
]}

Heimann, P. A. ^{[11
]}

Hajkova, V. ^{[2
]}

Juha, L. ^{[2
]}

Jurek, M. ^{[2
]}

Khattak, F. Y. ^{[6
]}

Kozlova, M. ^{[2
]}

Krzywinski, J. ^{[8
]}

Lee, R. W. ^{[5
]}

Nagler, B. ^{[9
]}

Nelson, A. J. ^{[5
]}

Rosmej, F. B. ^{[10
]}

Soberierski, R. ^{[7
]}

Toleikis, S. ^{[4
]}

Tschentscher, T. ^{[4
]}

Vinko, S. M. ^{[9
]}

Wark, J. S. ^{[9
]}

Whitcher, T. ^{[9
]}

Riley, D. ^{[1
]}

机构：

[1] Queens Univ, Sch Math & Phys, Belfast BT7 1NN, Antrim, North Ireland

[2] Acad Sci Czech Republ, Inst Phys, Prague 8, Czech Republic

[3] Inst Super Tecn, Ctr Fis Plasmas, Lisbon, Portugal

[4] DESY, D-22607 Hamburg, Germany

[5] Lawrence Livermore Natl Lab, Livermore, CA 94551 USA

[6] Kohat Univ Sci & Technol, Dept Phys, Kohat 26000, Nwfp, Pakistan

[7] Polish Acad Sci, Inst Phys, PL-00901 Warsaw, Poland

[8] SLAC Natl Accelerator Lab, Menlo Pk, CA 94025 USA

[9] Univ Oxford, Clarendon Lab, Oxford OX1 3PU, England

[10] Univ Paris 06, UMR 7605, F-75252 Paris 05, France

[11] Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA

来源：

HIGH ENERGY DENSITY PHYSICS | 2010年 / 6卷 / 01期

基金：

英国工程与自然科学研究理事会;

关键词：

XUV spectroscopy; VUV-FEL; Warm dense plasma;

D O I：

10.1016/j.hedp.2009.05.017

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

The FLASH XUV-free electron laser has been used to irradiate solid samples at intensities of the order 10(16) W cm(-2) at a wavelength of 13.5 nm. The subsequent time integrated XUV emission was observed with a grating spectrometer. The electron temperature inferred from plasma line ratios was in the range 5-8 eV with electron density in the range 10(21)-10(22) cm(-3). These results are consistent with the saturation of absorption through bleaching of the L-edge by intense photo-absorption reported in an earlier publication. (C) 2009 Elsevier B.V. All rights reserved.

引用

页码：109 / 112

页数：4

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