Isotropic strain and magnetic properties in Ni films

被引:1
|
作者
Callegaro, L
Puppin, E
机构
[1] Ist Elettrotecnico Nazl Galileo Ferraris, Elect Metrol Dept, I-10135 Turin, Italy
[2] Politecn Milan, Dipartimento Fis, INFM, I-21032 Milan, Italy
关键词
D O I
10.1103/PhysRevB.59.146
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Magnetic properties in isotropically stressed Ni films have been investigated with a recently developed experimental technique. The anisotropy field (Hk) is strongly reduced by a tensile isotropic strain in the film plane: for a radial strain of 0.34%, a 21% reduction of H-k is observed. These data are discussed in terms of a simple phenomenological model which, in spite of its simplicity and lack of adjustable parameters, gives a correct prediction of the experimental trend with a satisfactory quantitative agreement. [S0163-1829(99)09001-3].
引用
收藏
页码:146 / 148
页数:3
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