Investigation of the Morphological Evolution and Etching Kinetics of black Silicon During Ni-Assisted Chemical Etching

被引：5
|
作者：
Volovlikova, O. V. [1 ]
Silakov, G. O. [1 ]
Gavrilov, S. A. [1 ]
Dudin, A. A. [2 ]
Diudbin, G. O. [2 ]
Shilyaeva, Y. I. [1 ]
机构：
[1] Natl Res Univ Elect Technol MIET, Moscow, Russia
[2] Russian Acad Sci, Inst Nanotechnol Microelect, Moscow, Russia
来源：
APPLIED NANOTECHNOLOGY AND NANOSCIENCE INTERNATIONAL CONFERENCE 2017 (ANNIC 2017) | 2018年 / 987卷
基金：
俄罗斯科学基金会;
关键词：
MECHANISM;
D O I：
10.1088/1742-6596/987/1/012039
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Kinetics of contact angle of solutions contained HF (40%):H2O2(30%):C2H5OH:H2O on Si/Ni has been investigated. The effect of the ethanol concentration on the morphology of the porous silicon formed by Ni-assisted chemical etching is discussed. The influence of ethanol concentration on the morphology of the porous silicon was established by water contact angle and roughness factor.
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页数：8
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