Simultaneous maxillary and mandibular distraction osteogenesis with a semiburied device

被引：21
|
作者：
Padwa, BL
Kearns, GJ
Todd, R
Troulis, M
Mulliken, JB
Kaban, LB
机构：
[1] Massachusetts Gen Hosp, Childrens Hosp, Dept Oral & Maxillofacial Surg, Boston, MA 02115 USA
[2] Harvard Univ, Sch Dent Med, Boston, MA 02115 USA
[3] Childrens Hosp, Dept Surg, Div Plast Surg, Boston, MA 02115 USA
[4] Harvard Univ, Sch Med, Boston, MA 02115 USA
来源：
INTERNATIONAL JOURNAL OF ORAL AND MAXILLOFACIAL SURGERY | 1999年 / 28卷 / 01期
关键词：
mandibular distraction; hemifacial microsomia; Treacher Collins syndrome; semiburied distraction device;
D O I：
10.1016/S0901-5027(99)80667-5
中图分类号：
R78 [口腔科学];
学科分类号：
1003 ;
摘要：
Distraction osteogenesis is a technique utilizing natural healing mechanisms to generate new bone; it is commonly used to lengthen the hypoplastic mandible. Distraction of the maxilla and mandible as a unit is an obvious extension of the technique. We describe the application of a semiburied distracter to simultaneously lengthen the mandible and maxilla and level a canted occlusal plane in three cases. The indications for bimaxillary distraction are reviewed, including its advantages, disadvantages and limitations.
引用
收藏
页码：2 / 8
页数：7
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