Thickness and photocatalytic activity relation in TiO2:N films grown by atomic layer deposition with methylene-blue and E-coli bacteria

被引:0
|
作者
Contreras Turrubiartes, M. M. M. [1 ]
Lopez Luna, E. [1 ]
Enriquez-Carrejo, J. L. [2 ]
Pedroza Rodriguez, A. [3 ]
Salcedo Reyes, J. C. [3 ]
Vidal Borbolla, M. A. [1 ]
Mani-Gonzalez, P. G. [2 ]
机构
[1] Univ Autonoma San Luis Potosi, Coordinac Innovac & Aplicac Ciencia & Tecnol, Sierra Leona 550,Lomas 2a Secc, San Luis Potosi, Mexico
[2] Univ Autonoma Ciudad Juarez, Inst Ingn & Tecnol, Dept Fis & Matemat, Ave Del Charro 450, Juarez 32310, Chihuahua, Mexico
[3] Pontificia Univ Javeriana, Carrera 7 40-62, Bogota, Colombia
关键词
Photocatalytic; atomic layer deposition; anatase phase; photoluminescence; degradation; inactivation; ANATASE THIN-FILMS; TITANIUM-DIOXIDE; SPRAY-PYROLYSIS; NANOPARTICLES; INACTIVATION; ACID;
D O I
10.1007/s12034-017-1450-9
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This study presents an analysis of the photocatalytic efficiency in :N thin films grown by atomic layer deposition related to the film thickness. The nitriding process was carried out with nitrogen plasma by molecular nitrogen decomposition after deposition. The study was performed using the time-dependent degradation of colour units for methylene-blue solutions and inactivation percentages for Escherichia coli bacteria, for potential applications in sewage purification. To determine the optoelectronic properties of the films, the optical, structural, surface and thickness characterizations were carried out by photoluminescence, Raman spectroscopy, atomic force microscopy and scanning electron microscopy, respectively.
引用
收藏
页码:1225 / 1230
页数:6
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