Narrow-stripe selective MOVPE for high-quality InGaAsP MQWS and its application to photonic integrated circuits

被引:6
|
作者
Sasaki, T [1 ]
Yamaguchi, M [1 ]
机构
[1] NEC Corp Ltd, Optoelect & High Frequency Device Res Labs, Tsukuba, Ibaraki 3058501, Japan
关键词
D O I
10.1109/ICIPRM.1998.712475
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The recent advances in optical-fiber communication systems have required various high performance photonic components with high yield. Our approach using a narrow-stripe selective MOVPE technique has significant advantages because of its direct waveguide formation and bandgap energy control capabilities. After optimizing growth conditions, we obtained high-quality InGaAsP MQWs with comparable optical properties to that on an unmasked wafer. Excellent device characteristics and high device uniformity are also confirmed for laser diodes on a 2-inch InP wafer. Spot-size converter integrated laser diodes are also successfully fabricated, which can be used to achieve a low-cost transmitter module. Because of high structural uniformity, we obtained a fine lasing wavelength distribution for 40-channel electroabsorption modulator integrated DFB laser diodes. These integrated devices were fabricated by a process comparable to that for single-wavelength laser diodes. This direct waveguide formation process is a efficient fabrication tool for manufacturing various photonic components.
引用
收藏
页码:353 / 356
页数:4
相关论文
共 14 条
  • [1] Migration-controlled narrow-stripe selective MOVPE for high-quality InGaAsP/InGaAsP MQWs
    NEC Corp, Ibaraki, Japan
    [J]. J Cryst Growth, 1-4 (634-638):
  • [2] Migration-controlled narrow-stripe selective MOVPE for high-quality InGaAsP/InGaAsP MQWs
    Kudo, K
    Sasaki, T
    Yamaguchi, M
    [J]. JOURNAL OF CRYSTAL GROWTH, 1997, 170 (1-4) : 634 - 638
  • [3] Narrow-stripe selective growth of high-quality MQWs by atmospheric-pressure MOVPE
    Mori, K
    Hatakeyama, H
    Hamamoto, K
    Komatsu, K
    Sasaki, T
    Matsumoto, T
    [J]. JOURNAL OF CRYSTAL GROWTH, 1998, 195 (1-4) : 466 - 473
  • [4] Growth pressure dependence of neighboring mask interference in densely arrayed narrow-stripe selective MOVPE for integrated photonic devices
    Sudo, S
    Yokoyama, Y
    Nakazaki, T
    Mori, K
    Kudo, K
    Yamaguchi, M
    Sasaki, T
    [J]. JOURNAL OF CRYSTAL GROWTH, 2000, 221 : 189 - 195
  • [5] 1.3-μm spot-size-converter integrated laser diodes fabricated by narrow-stripe selective MOVPE
    NEC Corp, Tsukuba, Japan
    [J]. IEEE J Sel Top Quantum Electron, 6 (1392-1398):
  • [6] 1.3-μm spot-size-converter integrated laser diodes fabricated by narrow-stripe selective MOVPE
    Yamazaki, H
    Kudo, K
    Sasaki, T
    Sasaki, J
    Furushima, Y
    Sakata, Y
    Itoh, M
    Yamaguchi, M
    [J]. IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, 1997, 3 (06) : 1392 - 1398
  • [7] Pulse-mode selective MOVPE method for high-quality strained InGaAsP MQW structure
    Sakata, Y
    Inomoto, Y
    Komatsu, K
    [J]. 1998 INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE AND RELATED MATERIALS - CONFERENCE PROCEEDINGS, 1998, : 317 - 320
  • [8] In-plane bandgap energy controlled selective MOVPE and its applications to photonic integrated circuits
    Sasaki, T
    Yamaguchi, M
    Komatsu, K
    Mito, I
    [J]. IEICE TRANSACTIONS ON ELECTRONICS, 1997, E80C (05) : 654 - 663
  • [9] High-resolution microbeam x-ray diffractometry applied to InGaAsP/InP layers grown by narrow-stripe selective metal-organic vapor phase epitaxy
    Kimura, S
    Kimura, H
    Kobayashi, K
    Oohira, T
    Izumi, K
    Sakata, Y
    Tsusaka, Y
    Yokoyama, K
    Takeda, S
    Urakawa, M
    Kagoshima, Y
    Matsui, J
    [J]. APPLIED PHYSICS LETTERS, 2000, 77 (09) : 1286 - 1288
  • [10] High-Quality 150 mm InP-to-Silicon Epitaxial Transfer for Silicon Photonic Integrated Circuits
    Liang, D.
    Bowers, J. E.
    Oakley, D. C.
    Napoleone, A.
    Chapman, D. C.
    Chen, C. -L.
    Juodawlkis, P. W.
    Raday, O.
    [J]. ELECTROCHEMICAL AND SOLID STATE LETTERS, 2009, 12 (04) : H101 - H104