High-performance Ge-on-Si photodetector with optimized DBR location

被引:38
|
作者
Cui, Jishi [1 ]
Zhou, Zhiping [1 ]
机构
[1] Peking Univ, Sch Elect Engn & Comp Sci, State Key Lab Adv Opt Commun Syst & Networks, Beijing 100871, Peoples R China
关键词
GERMANIUM; PHOTODIODE; PHOTONICS;
D O I
10.1364/OL.42.005141
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We investigated the Ge-on-Si photodetector's performance enhancement by optimizing the detector length, therefore, the location of the distributed Bragg reflector (DBR). Since the unabsorbed signal light in the photodetector oscillates between the germanium and silicon layers, but the DBR is on the silicon layer, the optimized location of the DBR will result in shorter devices, with increased bandwidth, reduced dark current, and consistent responsivity. The 5 mu m long photodetector with an optimized DBR location shows responsivity of 0.72 A/W, at least 31.7 GHz 3 dB bandwidth; the dark current is only 7 nA at 1550 nm. (C) 2017 Optical Society of America
引用
收藏
页码:5141 / 5144
页数:4
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