Sequential and coherent electron tunneling in ferromagnetic planar junctions

被引:9
|
作者
Wilczynski, M
Barnas, J
机构
[1] Warsaw Univ Technol, Fac Phys, Warsaw, Poland
[2] AM Univ, Dept Phys, PL-61614 Poznan, Poland
关键词
electron tunneling; tunneling magnetoresistance; tunnel junctions;
D O I
10.1016/S0924-4247(01)00492-7
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We consider electron tunneling in ferromagnetic single-barrier and double-barrier planar junctions. The single-barrier junctions include additional thin films at the electrode/barrier interfaces. In the case of double-barrier systems, electron tunneling is considered in both sequential and coherent tunneling regimes. Generally, all components of the junctions, including external and central electrodes, thin metallic films and barriers can be ferromagnetic. We present numerical results for the following junctions: (i) single-barrier junctions with nonmagnetic barrier and nonmagnetic electrodes, but with thin ferromagnetic metallic films on both sides of the barrier; (ii) double-barrier junctions with ferromagnetic external electrodes and nonmagnetic barriers and central electrode; (iii) double-barrier junctions with ferromagnetic barriers and nonmagnetic central and external electrodes. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:188 / 191
页数:4
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